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Ogale, Satishchandra

Thin Films and Heterostructures for Oxide Electronics

€ 258.45

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physi


Taal / Language : English

Inhoudsopgave:
Preface ix
Ferroelectrics, Nano-scale phenomena, High k Dielectrics 1(126)
Chapter 1: Nanoscale Phenomena in Ferroelectric Thin Films.
V. Nagarajan, T. Zhao, H. Zheng and R. Ramesh
3(28)
Chapter 2: High-K Candidates for use as the Gate Dielectric in Silicon MOSFETs
D.G. Schlom, C.A. Billman, J.H. Haeni, J. Lettieri, P.H. Tan, R.R.M. Held, S. Völk and K.J. Hubbard
31(48)
Chapter 3: Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS.
Robert M. Wallace and Orlando Auciello
79(48)
Magnetic Memory and Spintronics 127(66)
Chapter 4: Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices.
Wolfgang Raberg and Arunava Gupta
129(24)
Chapter 5: Maganites, Magnetite, and Double-Perovskite Thin Films and Heterostructures.
S.B. Ogale, S.R. Shinde, T. Venkatesan and R. Ramesh
153(40)
Diluted Magnetic Semiconductors and Insulators 193(56)
Chapter 6: Diluted Magnetic Oxide Systems.
S.B. Ogale, S.R. Shinde, Darshan C. Kundaliya and T. Venkatesan
195(24)
Chapter 7: Epitaxial Growth and Properties of Magnetically Doped TiO2.
Scott A. Chambers, Timothy C. Droubay and Tiffany C. Kaspar
219(30)
Interfaces and Surfaces: Correlated Electron Systems 249(50)
Chapter 8: Interfaces in Materials with Correlated Electron Systems.
J. Mannhart
251(28)
Chapter 9: Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials.
A.J. Millis
279(20)
Wide Band Gap Semiconductors 299(32)
Chapter 10: Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices.
R.D. Vispute, S.S. Hullavarad, D.E. Pugel, V.N. Kulkarni, S. Dhar, I Takeuchi and T. Venkatesan
301(30)
Combinatorial Synthesis and Materials Discovery 331(22)
Chapter 11: Combinatorial Synthesis of Functional Metal Oxide Thin Films.
Ichiro Takeuchi
333(20)
Film Growth and Real-Time in situ Characterization 353(62)
Chapter 12: Real-Time Growth Monitoring by High-Pressure RHEED during Pulsed Laser Deposition.
Guus Rijnders and Dave H.A. Blank
355(30)
Chapter 13: Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition.
T. Venkatesan, K.S. Harshavardhan, M. Strikovski and J. Kim
385(30)
Index 415
Extra informatie: 
Hardback
Januari 2005
839 gram
235 x 159 x 32 mm
Springer-Verlag GmbH us

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